Page:Title 3 CFR 2007 Compilation.djvu/190

 Proc. 8214 Title 3--The President (I 58) 9031,80.40 Electron beam microscopes fitted wilh equipment specificall\177 designed for the handling and transport of semiconductor wafers or n\177icles (I 59) 90.31,90,54 Par\177s and accessories of optical insmimeals and appliances for i\177specting \177emicor\177l\177ctor waf\177 or d\177-wic\177 or for i\177'pectin\177 mas\177, photomasks or r\177icles used in manufacturing s\177niconduclor devices (160} \177031.90.54 Parts and accessories of phOtomicrosraphJc micl'oscopes fitted with equipment sp\177ifically d\177si\177.JaXi for the hal\177iling and lra\177spoil of semicongaclor waf\177 or r\177icles (161) 9031.90.54 Pans and accmsori\177s of optical insraiments a\177cl appliances for m\177asuri\177g surface pallfculate contamination on semiconductor wafers (162) 9031.90..\1774 Pans and acce\177ssorlm of optical sle. r\177scopic microscopes fitted wi\177h equipm\177'm specifically d\177sigaed for the handllnff ar\177l lranspon of \177emicondocior wafers or \177'e\177icles (163) 9031.90.70 Pans and accmsorlm of electron beam microscopes fitted with equipmenl specifically designeg for the handllnff and tmnsporl of s\177miconduclor warera or reticles" 190

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