Page:Copyright Office Compendium 3rd Edition - Full.djvu/758

, Third Edition 1210.1 Registration in Most Complete Form Required

Owners seeking registration of a mask work must submit the entire original mask work in its most complete form as fixed in a semiconductor chip product, with the exception of entire unpersonalized gate arrays and custom metallization layers (which may be registered separately). 37 C.F.R. § 211.4(c)(2). The "most complete form" means the stage of the manufacturing process that is closest to completion. 37 C.F.R. § 211.4(e).

1210.2 What to File: Required Elements for Registration

Applications to register claims in mask works must contain the following three elements to be considered complete:

• A completed paper application using Form MW;

• A nonrefundable filing fee; and

• A deposit that contains identifying material. 37 C.F.R. § 211.4(b).

1210.2(A) Form MW

Applicants must use Form MW to register a claim in a mask work. This form is available on the U.S. Copyright Office's website atwww.copyright.gov/forms/formmwi.pdf, and for free upon request to the Public Information Office.

Applicants also may request a hard copy Form MW from the U.S. Copyright Office's Public Information Office by using one of the following forms of contact information:

• By telephone: (202) 707-9100.

• In Person: James Madison Building, Public Information Office, Room LM-401, Monday through Friday, between the hours of 8:30 a.m. - 5:00 p.m. Eastern Time, except on federal holidays.

• By U.S. Mail: Library of Congress, U.S. Copyright Office, 101 Independence Avenue SE, Washington, DC 20559-6000.

All forms submitted to the Office must be clear and legible and suitable for automatic feeding through a photocopier. Forms not meeting this requirement will be returned.

For information on completing Form MW and the Office's practices regarding the examination of the application, see Section 1212 below.

1210.2(B) Filing Fee

The current filing fee is set forth in the Office's fee schedule under the heading "Form MW (mask works)" (www.copyright.gov/docs/fees.html).

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